EENG 4010 Midterm

What is the primary function of soft-bake in the photolithography process?

To remove solvent and to promote adhesion of the resist layer to the wafer.

What is lithography method can be used for features size of 13.5 nm?

Extreme Ultraviolet (EUV) lithography (10-14 nm)

Imagine that a particular photolithography is exposed 10 secs, now a new 100 times brighter source is available. What is the new exposure time?

10/100 = 0.1 seconds

What term describes the specialized technique used to create microscale mechanical or non-electrical structures which may utilize materials beyond conventional silicon-based ones and not always compatible with standard CMOS processing?

Micromachining

Which technique uses UV light to transfer patterns onto photoresist-coated wafer?

Photolithography

What is the name of the influential lecture delivered by Richard Feynman on December 29, 1959, which is often acknowledged as a foresight into nanotechnology?

“There’s Plenty of Room at the Bottom”

What conditions determine the practicality of MEMS technology in different applications (when to use MEMS tech)?

When they match or surpass existing performance with cost reduction, or when they enable a substantial increase in functionality at a competitive cost.

Define MEMS full name?

Micro electro mechanical systems

What is the name of the well-established fabrication processor originally utilized in creating silicon integrated circuits for 40 years?

Conventional Microfabrication

What is the purpose of the OSHA standards?

Protect workers from hazardous chemicals in the lab

When working with moderately to extremely toxic chemicals what type of PPE do we need to wear?

Specific chemical resistant gloves

What does PPE stand for?

Personal Protective Equipment

Which U.S. federal agency is responsible for establishing and enforcing workplace safety and health regulations?

Occupational Safety Health Administration

Describe appropriate lab attire (just name one)

Long pants and closed toe shoes

How are chemicals classified in laboratory safety procedures, what condition defines a small spill?

500 milliliters or less

Fill in the blank. Human carcinogen chemical

Formaldehyde

Underline shows the pressure tank when the tank valve is opened?

Red i

What does SDS stand for?

Safety Data Sheet

How long to flush if exposed to a chemical on the skin?

15 minutes

GHS Pictogram: Flame over circle

Oxidizing Liquids

What is the purpose of using yellow light in a cleanroom?

To protect light-sensitive materials from being accidentally exposed

What are the two types of environment mentioned for the photolithography?

Class 10 or better

Which of the following is not a contaminant on the wafer? a. Dust, b. Photoresist Residue, c. Solvent, d. Metals,

C. Solvent

What is the primary benefit of using negative photoresist?

Permanent Uses

“Which type of transistor forms a conducting channel on three sides of a fin, resulting in fully depleted operation and improved channel control?”

3D FinFET

Fill the blank: NMEMS Scale

Microsystems

Full name of ENIAC

Electronic Numerical Integrator and Computer

Full Name of the process in the diagram

Surface Micromachining

Problem Solving 1

Problem Solving 2

@ 365 nm. DOF = 365 nm / 1.0 = 365 nm, Resolution = 365 nm / (1.0)² = 356 nm ???

If Resolution is 2 micron, λ = (2 μm) (1) / 0.7 = 2.857 μm, DOF = (2.857 μm) (1)² / 0.7 = 2 μm ???