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Chip Specification
Defines functionality, performance, and physical constraints of the chip (e.g., read sensors, 100 MHz, 10mm x 10mm).
Output of Chip Specification
Requirements document describing what the chip must do.
Architecture Definition
Defines CPU structure (RISC/CISC), memory interface, I/O controllers, and communication protocols.
Output of Architecture Definition
High-level block diagrams and subsystem interfaces.
Functional Design
Behavioral description using HDL such as Verilog or VHDL.
Output of Functional Design
Simulated HDL code that matches intended behavior.
Logic Design
Converts HDL into Boolean logic and gate-level circuits (XOR, AND, OR).
Output of Logic Design
Gate-level netlist.
CMOS Inverter (Functional)
Output = NOT(input); implemented as b = ~a in Verilog.
Circuit Design
Transistor-level implementation of logic gates using CMOS.
Output of Circuit Design
Transistor-level schematics with device sizing.
Physical Design
Layout of transistors, routing, standard cells, and DRC/LVS checks.
Output of Physical Design
GDSII layout file ready for fabrication.
Wafer Processing
Creating silicon wafers from melted ingots at ≥1400°C.
Photolithography
Mask-based patterning using light and photoresist.
Steps of Photolithography
Coat → Expose → Develop → Etch → Strip.
Ion Implantation
Adds dopants to form NMOS/PMOS regions and adjust threshold voltage.
Metallization
Adds interconnect layers between devices.
Planarization
Polishes wafer surface to make it flat for additional layers.
Assembly and Packaging
Protects the chip and connects it to the outside world.
Wafer Test
Tests each die before packaging to avoid wasting packages.
Package Test
Final electrical testing after packaging.
NMOS Behavior
Conducts when gate voltage is HIGH.
PMOS Behavior
Conducts when gate voltage is LOW.
CMOS Inverter Pull-Up Device
PMOS pulls output HIGH.
CMOS Inverter Pull-Down Device
NMOS pulls output LOW.
Mead-Conway Methodology
Enabled structured, modular, scalable chip design and modern CAD tools.
Transition to CMOS
Provided low power, fast switching, and high density for VLSI.
Standard Cell Design
Uses reusable layout blocks to speed up physical design.
Deep Submicron Fabrication
Scaling from 180nm to 7nm with advanced lithography and doping precision.
System-on-Chip Integration
Combines CPU, GPU, memory, and I/O on a single chip.