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Vocabulary flashcards related to surface characterization techniques discussed in the lecture.
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X-ray Photoelectron Spectroscopy (XPS)
A technique that analyzes the surface of a material by measuring the kinetic energy of electrons ejected by X-ray photons.
Auger Spectroscopy (AES)
A surface analysis technique that measures the emission of Auger electrons to identify elemental composition.
Secondary Ion Mass Spectrometry (SIMS)
A method where high-energy ions bombard a sample, leading to the ejection of neutral and charged particles for mass analysis.
Laser Microprobe Mass Spectrometry
A technique using laser ablation to vaporize samples, allowing analysis via mass spectrometry.
Scanning Electron Microscopy (SEM)
An imaging technique that uses a focused beam of electrons to scan the surface of a sample and produce images.
Electron Microprobe
An analytical technique that uses incident electrons to produce X-rays from a sample for compositional analysis.
Photoemission Cross-Section
A term that describes the probability of emission from a given core level of an atom in photoemission spectroscopy.
Chemical Shift
A variation in binding energy observed in X-ray photoelectron spectroscopy related to the chemical environment of the atoms.
Ultra-High Vacuum (UHV) Chamber
A chamber used to conduct experiments in XPS to prevent air from interfering with electron detection.
Mean Free Path
The average distance traveled by electrons in a material before colliding with other atoms.
Sputtering
A process where surface atoms are ejected from a material after bombardment by energetic particles.
Binding Energy (BE)
The energy required to remove an electron from an atom, crucial for identifying elemental composition.
Relative Sensitivity Factor (S)
A calibration factor that relates the intensity of the photoelectron signal to atomic concentration in quantitative analysis.
Depth Profiling
A technique used in surface analysis to reveal the composition of different layers within a sample.
Auger Emission
The process where an ionized atom ejects an Auger electron after being excited by an incident photon or electron.