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Zaitsev alkene product
more substituted, thermodynamic product
Hofmann alkene product
less substituted, kinetic product
SN2 mechanism
substrate is attacked by the Lewis base acting as a nucleophile, forming a new σ-bond and breaking the old C-LG σ-bond at the same time
E2 mechanism
substrate is attacked by the Lewis base acting as a base, deprotonating the adjacent C-H bond, forming a new π-bond, and breaking the old C-LG σ-bond at the same time
SN2/E2 reaction coordinate
SN and E reactions are usually exothermic
SN2 has lower activation energy barrier, but higher energy products
E2 has higher activation energy barrier, but lower energy products
key features of SN2 reactions
bimolecular rate determining step (no carbocation formation)
nucleophile must approach 180° from the C-LG bond
inversion of configuration (sp3 carbon is turned inside out, not racemic)
SN2 preference with unhindered substrates (1°/2°)
key features of E2 reactions
bimolecular rate determining step (no carbocation formation)
C-H must have 180° dihedral angle to C-LG (anti-coplanar)
π-bond forms between the two new, parallel p-orbitals
Zaitsev alkene for strong, unhindered bases vs Hofmann alkene for strong, hindered bases
E2 possible with all appropriate substrates
bulky strong bases (poor nucleophiles)
-OtBu (alkoxides)
LDA (-NiPr2)
considerations for basicity
charge
electronegativity
influence of nearby inductive or resonance EWG/EDG
considerations for nucleophilicity
charge
electronegativity
influence of nearby inductive or resonance EWG/EDG
sterics (bulkiness)
polarizability (large element anions are better nucleophiles than bases)
negatively charged Lewis bases
typically more reactive than neutral ones
neutral Lewis base
usually contains a nitrogen, oxygen, or sulfur
solvent preference for SN2/E2
polar aprotic solvent (less efficient solvatation of anionic base is better)
SN2 reactions with halide substrate
commonly performed under anionic conditions with good nucleophiles in aprotic solvents
SN2 reactions with alcohol substrate
nucleophile can come from a strong HX acid that has a nucleophilic conjugate base, a halogenating agent, or can be converted to a sulfonate
OH is converted into a better leaving group before reaction
performed under neutral conditions in aprotic solvent (halogenating/sulfonate)
strong acid SN2 alcohol reaction
acidic/aqueous
alcohol to halide
SN1 or SN2
PBr3 SN2 alcohol reaction
non-aqueous (aprotic)
alcohol to bromide
SOCl2 SN2 alcohol reaction
non-aqueous (aprotic)
alcohol to chloride
SN1 or SN2 (pyridine)
ClSO2R SN2 alcohol reaction
non-aqueous (aprotic)
alcohol to sulfonate (pseudo halide)
E2 reactions with halide substrate
dehydrohalogenation because there is a net removal of HX
performed in anionic conditions (with strong base), at high temperatures
depending on the base, Zaitsev or Hofmann elimination can be favoured
E2 reactions with alcohol substrate
not possible
acid-base reactions dominate when a strong base is added to an alcohol
elimination reactions of alcohols must be done in strong acid using E1 mechanisms
factors that effect SN2 and E2 reactions
structure of the substrate
concentration/nature of Lewis base (stronger are faster)
nature of the leaving group (weaker bases are fastest)
effect of the solvent (polar aprotic is fastest)
temperature (higher temperature favours E2)