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flat panel detector
an array of pixel-size detectors (DELs)
array of pixels fastened to a glass base/substrate
contains a capacitor and TFT switch
photoconductors
part of the detector that:
absorbs x-rays and emits an electrical charge
converts light to electronic signal
scintillators
part of the detector that:
absorbs x-rays and emits light
made of phosphorus
difference between DEL and DEXEL
DEL - before exposure
DEXEL - after being exposed
what determines whether an IR is direct or indirect?
the absorption material
indirect has a cesium iodide scintillator
indirect uses amorphous silicon (a-Si) photoconductor
direct uses amorphous selenium (a-Se) photoconductor
direct capture IR system
single step system
x-rays strike photoconductor
made of amorphous selenium (a-Se)
converts x-rays to electronic signal
signal is stored in DEL capacitor temporarily
TFT switching gate releases signal to be read out
read out for direct capture system
DELS are read out line by line
amplifier amplifies the signal
ADC converts signal
signal is sent to computer for processing
3 components of a DEL
semiconductor surface area
capacitor
TFT switching gate
fill factor of the DEL
the % of a detector’s elements area dedicated to x-ray absorption
80% is high
higher fill factor equals
higher contrast resolution
higher spatial resolution
TFT readout
DEL chargers are read out on a pixel by pixel and column by column basis
indirect capture types
scintillator used with charge coupled device (CDC)
scintillator used with thin film transistor (TFT) detector
charged coupled device (CDC)
light sensitive device that can respond to very low intensities
CDC in indirect capture systems
x-ray strikes scintillator (CsI or GDOS) which emits light
signal is transmitted by fiber optic cables to CCD
photoconductor made of amorphous silicon (a-Si) converts light to electronic
charge is released and sent to ADC
ADC sends electronic signal to computer
bucket brigade readout
each DEL contains 3 electrodes that hold electrons in a potential “well”
voltage gates open to allow electrons to flow down row to “read out” row
data sent sequentially to amplifier, which then digitizes signal
system of read out known as a bucket brigade scheme
TFT in indirect capture systems
x-ray strikes scintillator (CsI or GDOS) which emits light
photoconductor made of amorphous silicon (a-Si) converts light to electronic signal
TFT array captures electrical charge in DEL and stores in capacitor
TFT switch sends signal to ADC
ADC sends electronic signal to computer
DEL of indirect conversion system
cesium iodide phosphor absorbs x-ray and emits light
amorphous silicon then absorbs and emits electrons
structured scintillator construction
needle like structure
increased x-ray interactions
less light spread
improved resolution
unstructured scintillator construction
light scatters
reduced spatial resolution
CMOS stands for
complementary metal oxide conductor
CMOS in indirect capture system
x-ray strikes scintillator (CsI or GDOS) which emits light
each DEL contains its own transmitter, amplifier, noise correction circuit, and digitization circuit
decreases fill factors
increases noise
signal read out is different from CCD
DELs charge is sent across the chip and read in a corner of the array
signal is dent to ADC
CCD vs CMOS
CCD
better light sensitivity
greater fill factor for better image quality
modular construction
easy to repair and upgrade
uses more power
110 times more than CMOS
CMOS
more susceptible to noise
lower light sensitivity
lower fill factor
uses less power
inexpensive to manufacture
lower quality
lower resolution
image lag (ghosting)
detector doesn’t clear signal from previous image
gain calibration
used to compensate for sensitivity variation across the detector