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Vocabulary practice flashcards reviewing fundamental concepts, properties, and equations from the Semiconductor Electronics lecture notes.
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Metals (Resistivity and Conductivity Range)
Materials possessing very low resistivity (ρ∼10−2 to 10−8Ωm) and high conductivity (σ∼102 to 108Sm−1).
Semiconductors (Resistivity and Conductivity Range)
Materials with resistivity (ρ∼10−2 to 106Ωm) or conductivity (σ∼102 to 10−6Sm−1) intermediate to metals and insulators.
Insulators (Resistivity and Conductivity Range)
Materials having high resistance or resistivity (ρ∼1011 to 1019Ωm) and low conductivity (σ∼10−11 to 10−19Sm−1).
Forbidden Energy Gap (FEG)
The energy gap between the conduction band minimum and valence band maximum (ΔEg=(CB)min−(VB)max) where free electrons cannot exist.

Holes
Unfilled energy levels left in the valence band when an electron leaves for the conduction band; they act mathematically as positive charge carriers.
Intrinsic Semiconductor
A pure semiconductor made up of a single element (such as Silicon or Germanium) or pure compound without added impurities.
Intrinsic Carrier Concentration (ni)
The carrier concentration in a pure semiconductor where the number of thermally generated electrons (ne) equals the number of holes (np or nh), written as ne=nh=ni.
Doping
The process of deliberate addition of a very small amount of suitable impurity (dopants) into an intrinsic semiconductor to increase its electrical conductivity.
Dopants
Impurity atoms deliberately added into an intrinsic semiconductor to alter its charge carrier concentration.
Extrinsic Semiconductor
A semiconductor containing added impurity atoms (dopants), also referred to as an impure semiconductor.
Pentavalent Dopants
Impurity elements with valency 5 (such as Arsenic, Antimony, and Phosphorus) used to create N-type semiconductors.
Trivalent Dopants
Impurity elements with valency 3 (such as Indium, Boron, and Aluminium) used to create P-type semiconductors.
N-Type Semiconductor
An extrinsic semiconductor formed by doping tetravalent Si or Ge with pentavalent donor impurities, resulting in free electrons as majority carriers (ne≫nh) and holes as minority carriers.
P-Type Semiconductor
An extrinsic semiconductor formed by doping tetravalent Si or Ge with trivalent acceptor impurities, resulting in holes as majority carriers (nh≫ne) and electrons as minority carriers.
Mass Action Law
A fundamental equation for semiconductors in thermal equilibrium stating that the product of electron concentration (ne) and hole concentration (nh) equals the square of the intrinsic carrier concentration (ni2): nenh=ni2.
Drift Velocity (vd)
The average velocity gained by free charge carriers under the influence of an applied electric field E, given by vd=μE, where μ is mobility.
Current Density (J)
Electric current per unit cross-sectional area (J=I/A), expressed in terms of charge carriers as J=nevd=neμE=σE.
Electron Mobility vs. Hole Mobility
In semiconductors, electron mobility (μe) is greater than hole mobility (μh) (μe>μh) because electrons move in the conduction band while holes move in the valence band.
Band Gap of Silicon (Eg)
The energy band gap for a Silicon crystal, which is 1.1eV.
Band Gap of Germanium (Eg)
The energy band gap for a Germanium crystal, which is 0.7eV (or 0.74eV in detailed band structures).