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Basic Semiconductor Devices and Atomic Structure – Vocabulary Flashcards
Basic Semiconductor Devices and Atomic Structure – Vocabulary Flashcards
The Atom
All matter composed of atoms that typically contain electrons, protons, neutrons (normal hydrogen lacks a neutron)
Each chemical element → unique atomic structure defined by proton count (atomic number)
Early view: indivisible sphere ➔ superseded by models
Bohr (planetary) model: electrons orbit dense nucleus in discrete shells
Quantum model: more accurate, statistical (probability clouds) but harder to visualise; governed by
Wave-Particle Duality
Heisenberg Uncertainty Principle
Superposition Principle (e.g.
Schrödinger’s cat thought experiment)
Key particles
Electron (−), Proton (+), Neutron (0)
Nucleus = protons + neutrons
Atomic number Z = #protons = #electrons (neutral atom)
Electron shells/energy levels numbered n=1,2,3,\dots; max electrons per shell N_e = 2n^{2}
Examples: 1st shell 2e⁻, 2nd 8e⁻, 3rd 18e⁻, 4th 32e⁻
Valence electrons = electrons in outermost shell → determine chemical & electrical properties
Ionisation: supplying ≥ ionisation energy allows valence e⁻ to escape → free electron + positive ion; reverse capture yields negative ion
Materials Used in Electronic Devices
Electrical categories
Insulators: very high resistivity; tightly-bound valence e⁻ (rubber, glass)
Conductors: single-element metals with 1 loosely-bound valence e⁻ (Cu, Ag, Au, Al) → abundant free e⁻
Semiconductors: between above; intrinsic Si, Ge, etc. have 4 valence e⁻
Band theory
Valence band (VB) vs Conduction band (CB)
Band gap E_g: energy difference VB→CB
Insulators: large E_g (only crossed under breakdown)
Semiconductors: moderate E_g (photon/thermal energy can excite e⁻)
Conductors: VB and CB overlap (no gap)
Silicon vs Copper atoms
Si core net +4, valence e⁻ in 3rd shell
Cu core net +1, valence e⁻ in 4th shell ➔ Cu e⁻ easier to free
Si vs Ge
Both 4 valence e⁻; Ge valence e⁻ in 4th shell (higher energy) → more temperature-sensitive
Covalent bond: sharing of valence e⁻ between atoms in crystal lattice (e.g. silicon crystal)
Intrinsic crystal = pure (no impurities)
Current in Semiconductors
At absolute 0\,K, CB empty
At room T, thermal energy generates electron–hole pairs (EHP)
Free/conduction electrons in CB
Corresponding hole in VB
Recombination: free e⁻ loses energy and falls into hole
Two current mechanisms under applied voltage V
Electron current (CB): free e⁻ drift toward + potential
Hole current (VB): valence e⁻ move into adjacent holes → holes drift toward – potential
Contrast: metals have only free-electron current (no holes)
Extrinsic Semiconductors – Doping
Doping adds controlled impurity atoms to increase carriers
n-type: add pentavalent (Sb, As, P) donors → extra free e⁻ (majority carriers = electrons, minority = holes)
p-type: add trivalent (B, Ga, In) acceptors → create holes (majority = holes, minority = electrons)
Doping terminology
Majority vs Minority carriers
Doping ≠ thermal EHP generation (minority carriers)
Intrinsic vs Extrinsic: pure vs doped material
PN Junction Fundamentals
Formed by adjoining p and n regions
Initial diffusion: e⁻ cross into p side & recombine with holes; holes diffuse opposite → leave charged ion cores
Depletion region: immobile ion layers; depleted of mobile carriers
Electric field across depletion ➔ barrier potential V_B
Typical V_B: Si ≈ 0.7\,\text{V}, Ge ≈ 0.3\,\text{V} (25 °C)
Equilibrium: diffusion current balanced by electric-field drift → no net current
Energy-band view: “energy hill” across depletion
Diode Operation
Two-terminal pn-junction device
Forward Bias (FB)
n connected to −, p to +; V
{BIAS} > V
B
Depletion narrows; carriers cross; diode conducts
Forward voltage drop V
F \approx V
B + I
F r'
d (dynamic resistance small)
Reverse Bias (RB)
p to −, n to +; depletion widens; only tiny reverse current I_R (minority-carrier) flows
Reverse breakdown at V_{BR} → avalanche; must limit current
Voltage–Current (V-I) Characteristic
FB curve: knee at \approx 0.7\,\text{V} (Si). Above knee, I
F increases exponentially; V
F nearly constant
Dynamic (ac) resistance r'
d = \Delta V
F / \Delta I
F, decreases as I
F rises
RB curve: negligible I
R until V
{BR}, then steep increase
Complete V-I curve combines both regions; temperature ↑ ⇒
V_B decreases ≈ 2\,\text{mV}/^{\circ}!\text{C} (Si)
I_R increases
Diode Approximations
Ideal: V
F=0, r'
d=0, I_R=0 (switch model)
Practical: constant 0.7\,\text{V} drop (Si) in FB; RB open
Complete: includes V
B, r'
d in FB, large r'
R and I
R in RB
Rectifiers
Half-Wave Rectifier (HWR)
Single diode + load
Conducts on one half-cycle ⇒ output pulsating dc (freq = input f)
Average output V
{AVG}=\dfrac{V
p}{\pi} (≈31.8 % of V_p)
Peak inverse voltage \text{PIV}=V_p(\text{in})
Transformer coupling: V
{sec}=n V
{pri} (turns ratio n=N
{sec}/N
{pri})
Full-Wave Rectifier (FWR)
Center-Tapped (CT): two diodes + CT secondary
Each diode conducts on alternate half-cycles
Output freq 2f
V
{p(out)}=V
{sec}/2 -0.7\,\text{V}
\text{PIV}=2V_{p(out)}+0.7
Bridge: four diodes, no CT
V
{p(out)}=V
{sec}-1.4\,\text{V} (two diode drops)
\text{PIV}=V_{p(out)}+0.7 per diode
Full-wave average V
{AVG}=\dfrac{2V
p}{\pi} (≈63.7 % of V_p)
Power-Supply Filters & Regulators
Capacitor-input (π-filter) most common
Capacitor charges to peak, discharges through R
L ⇒ ripple voltage V
{r(pp)}
For FWR approx: V
{r(pp)} \approx \dfrac{V
{p(rect)}}{f R_L C} ( f=120\,\text{Hz} )
Ripple factor r=V
{r(pp)}/(2\sqrt{2}V
{DC}); smaller r = better filtering
Surge current occurs at power-on while capacitor uncharged ⇒ use slow-blow fuse in primary
Voltage regulators (3-terminal IC)
Maintain constant V_{out} vs line or load changes
Line regulation: \Delta V
{out}/\Delta V
{in}
Load regulation: \dfrac{V
{NL}-V
{FL}}{V_{FL}}\times100\%
Zener Diode
Heavily-doped junction designed for operation in reverse breakdown at precise V_Z (≈ 1 V – 250 V)
Breakdown mechanisms
Zener (<5 V): field-ionisation
Avalanche (>5 V)
Zener equivalent
Ideal: constant voltage source V_Z (reverse)
Practical: includes small impedance Z
Z = \Delta V
Z/\Delta I_Z
Regulation limits: I
{ZK} ≤ I
Z ≤ I
{ZM} (max via P
D(max)=V
Z I
{ZM})
Temperature coefficient TC: \Delta V
Z = V
Z \times TC \times \Delta T
Power derating above 25 °C: P
{max}(T)=P
{25}-DF\,(T-25)
Applications
Voltage reference/regulator (series resistor limits current)
Limiter/clipper circuits
Varactor (Varicap) Diode
Reverse-biased pn junction acts as voltage-controlled capacitor: C
T \propto 1/\sqrt{V
R}
Doping profile & geometry set C
{max}, C
{min}, C_R (capacitance ratio)
Used in tuners, VCOs, filters; often back-to-back for symmetrical characteristics
Optical Diodes
Light-Emitting Diode (LED)
Forward bias → e⁻-hole recombination releases photons (electroluminescence)
Materials dictate colour (GaAs IR, GaAsP red–yellow, GaN blue, InGaN white with phosphor)
V
F ≈ 1.2–3.2 V; I
F 10–30 mA
Radiation patterns vary (indicator vs high-intensity)
Applications: indicators, 7-segment displays, IR remote, traffic lights (series-parallel arrays), lighting
OLED: organic layers produce light; printable; flexible displays
Quantum dots: nano-crystals, size-dependent bandgap → colour tuning; used in LED filters, bio-imaging
Photodiode
Operates in reverse bias; photon absorption generates current proportional to irradiance
Dark current (no light) very small
Used in detectors, opto-isolators, fiber optics
Laser Diode: similar to LED but with resonant cavity → coherent monochromatic light; used in CD/DVD, fibre-optic, laser printers
Other Special-Purpose Diodes
Schottky (hot-carrier): metal-semiconductor junction; V_F ≈ 0.3 V; fast switching
PIN diode: intrinsic layer between p and n ➔ variable resistance (forward) or capacitance (reverse); RF switches, attenuators
Step-Recovery: graded junction; sharp turn-off → harmonic generation
Tunnel diode: very heavily doped; exhibits negative resistance region; microwave oscillators
Current-Regulator Diode (CRD): maintains constant current I
P over wide V
{AK} range
Bipolar Junction Transistor (BJT) Structure
Three doped regions: Emitter (heavily), Base (light, thin), Collector (moderate)
Two pn junctions: Base-Emitter (BE), Base-Collector (BC)
Types & symbols: npn (arrow out), pnp (arrow in); arrow indicates conventional emitter current
Basic BJT Operation
Forward-reverse bias for linear use: BE junction F-B, BC junction R-B
Current flow (npn)
Majority e⁻ injected from emitter to base; few recombine (IB); most swept into collector (IC)
Kirchhoff: I
E = I
C + I_B
Key Parameters
DC current gain \beta
{DC}=h
{FE}=I
C/I
B (20–200+)
\alpha
{DC}=I
C/I_E\approx \beta/(\beta+1)
DC Bias Analysis
With bias sources V
{BB},V
{CC} and resistors R
B,R
C
Approximate V_{BE}=0.7\,\text{V} (Si)
I
B=(V
{BB}-0.7)/R
B; I
C=\beta I_B
V
{CE}=V
{CC}-I
C R
C; V
{CB}=V
{CE}-0.7
Collector Characteristic Curves
Family of I
C vs V
{CE} for various I_B
Regions
Cutoff (IB≈0, IC≈0, VCE≈VCC)
Active/Linear (IC=βIB, BC reverse-biased)
Saturation (both junctions forward, IC at I_{C(sat)})
Breakdown (avoid)
I
{C(sat)}=(V
{CC}-V
{CE(sat)})/R
C (neglect V_{CE(sat)} small)
I
{B(min)}=I
{C(sat)}/\beta; design with I
B≫I
{B(min)}
DC load line: line between cutoff point (V
{CE}=V
{CC}, I
C=0) and saturation (V
{CE}=V
{CE(sat)}, I
C=I_{C(sat)}) on characteristic graph
Temperature & Ratings
β increases with temperature; device parameters vary
Maximum ratings: V
{CEO(max)}, V
{CBO(max)}, I
{C(max)}, P
{D(max)}
P
D = V
{CE} I_C; derate above 25 °C using datasheet factor (mW/°C)
BJT as a Voltage Amplifier
AC superimposed on DC bias
Small-signal emitter resistance r'
e ≈ 25\,mV/I
E (at 25 °C)
Voltage gain (common-emitter, unbypassed) A
v = - R
C / r'_e (negative sign ⇒ inversion)
Output V
o = A
v V_{in}
BJT as a Switch
Two states
Cutoff: I
B=0 ⇒ I
C\approx0, V
{CE}\approx V
{CC}
Saturation: I
B \ge I
{B(min)} ⇒ V
{CE}\approx V
{CE(sat)}\,(\sim0.1–0.3\,V), I
C=I
{C(sat)}
Application example: driving LED; ensure I
B > 2 I
{B(min)} for safe saturation
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