Basic Semiconductor Devices and Atomic Structure – Vocabulary Flashcards
The Atom
- All matter composed of atoms that typically contain electrons, protons, neutrons (normal hydrogen lacks a neutron)
- Each chemical element → unique atomic structure defined by proton count (atomic number)
- Early view: indivisible sphere ➔ superseded by models
- Bohr (planetary) model: electrons orbit dense nucleus in discrete shells
- Quantum model: more accurate, statistical (probability clouds) but harder to visualise; governed by
- Wave-Particle Duality
- Heisenberg Uncertainty Principle
- Superposition Principle (e.g.
Schrödinger’s cat thought experiment)
- Key particles
- Electron (−), Proton (+), Neutron (0)
- Nucleus = protons + neutrons
- Atomic number Z = #protons = #electrons (neutral atom)
- Electron shells/energy levels numbered n=1,2,3,\dots; max electrons per shell N_e = 2n^{2}
- Examples: 1st shell 2e⁻, 2nd 8e⁻, 3rd 18e⁻, 4th 32e⁻
- Valence electrons = electrons in outermost shell → determine chemical & electrical properties
- Ionisation: supplying ≥ ionisation energy allows valence e⁻ to escape → free electron + positive ion; reverse capture yields negative ion
Materials Used in Electronic Devices
- Electrical categories
- Insulators: very high resistivity; tightly-bound valence e⁻ (rubber, glass)
- Conductors: single-element metals with 1 loosely-bound valence e⁻ (Cu, Ag, Au, Al) → abundant free e⁻
- Semiconductors: between above; intrinsic Si, Ge, etc. have 4 valence e⁻
- Band theory
- Valence band (VB) vs Conduction band (CB)
- Band gap E_g: energy difference VB→CB
- Insulators: large E_g (only crossed under breakdown)
- Semiconductors: moderate E_g (photon/thermal energy can excite e⁻)
- Conductors: VB and CB overlap (no gap)
- Silicon vs Copper atoms
- Si core net +4, valence e⁻ in 3rd shell
- Cu core net +1, valence e⁻ in 4th shell ➔ Cu e⁻ easier to free
- Si vs Ge
- Both 4 valence e⁻; Ge valence e⁻ in 4th shell (higher energy) → more temperature-sensitive
- Covalent bond: sharing of valence e⁻ between atoms in crystal lattice (e.g.
silicon crystal)
- Intrinsic crystal = pure (no impurities)
Current in Semiconductors
- At absolute 0\,K, CB empty
- At room T, thermal energy generates electron–hole pairs (EHP)
- Free/conduction electrons in CB
- Corresponding hole in VB
- Recombination: free e⁻ loses energy and falls into hole
- Two current mechanisms under applied voltage V
- Electron current (CB): free e⁻ drift toward + potential
- Hole current (VB): valence e⁻ move into adjacent holes → holes drift toward – potential
- Contrast: metals have only free-electron current (no holes)
Extrinsic Semiconductors – Doping
- Doping adds controlled impurity atoms to increase carriers
- n-type: add pentavalent (Sb, As, P) donors → extra free e⁻ (majority carriers = electrons, minority = holes)
- p-type: add trivalent (B, Ga, In) acceptors → create holes (majority = holes, minority = electrons)
- Doping terminology
- Majority vs Minority carriers
- Doping ≠ thermal EHP generation (minority carriers)
- Intrinsic vs Extrinsic: pure vs doped material
PN Junction Fundamentals
- Formed by adjoining p and n regions
- Initial diffusion: e⁻ cross into p side & recombine with holes; holes diffuse opposite → leave charged ion cores
- Depletion region: immobile ion layers; depleted of mobile carriers
- Electric field across depletion ➔ barrier potential V_B
- Typical V_B: Si ≈ 0.7\,\text{V}, Ge ≈ 0.3\,\text{V} (25 °C)
- Equilibrium: diffusion current balanced by electric-field drift → no net current
- Energy-band view: “energy hill” across depletion
Diode Operation
- Two-terminal pn-junction device
- Forward Bias (FB)
- n connected to −, p to +; V{BIAS} > VB
- Depletion narrows; carriers cross; diode conducts
- Forward voltage drop VF \approx VB + IF r'd (dynamic resistance small)
- Reverse Bias (RB)
- p to −, n to +; depletion widens; only tiny reverse current I_R (minority-carrier) flows
- Reverse breakdown at V_{BR} → avalanche; must limit current
Voltage–Current (V-I) Characteristic
- FB curve: knee at \approx 0.7\,\text{V} (Si). Above knee, IF increases exponentially; VF nearly constant
- Dynamic (ac) resistance r'd = \Delta VF / \Delta IF, decreases as IF rises
- RB curve: negligible IR until V{BR}, then steep increase
- Complete V-I curve combines both regions; temperature ↑ ⇒
- V_B decreases ≈ 2\,\text{mV}/^{\circ}!\text{C} (Si)
- I_R increases
Diode Approximations
- Ideal: VF=0, r'd=0, I_R=0 (switch model)
- Practical: constant 0.7\,\text{V} drop (Si) in FB; RB open
- Complete: includes VB, r'd in FB, large r'R and IR in RB
Rectifiers
Half-Wave Rectifier (HWR)
- Single diode + load
- Conducts on one half-cycle ⇒ output pulsating dc (freq = input f)
- Average output V{AVG}=\dfrac{Vp}{\pi} (≈31.8 % of V_p)
- Peak inverse voltage \text{PIV}=V_p(\text{in})
- Transformer coupling: V{sec}=n V{pri} (turns ratio n=N{sec}/N{pri})
Full-Wave Rectifier (FWR)
- Center-Tapped (CT): two diodes + CT secondary
- Each diode conducts on alternate half-cycles
- Output freq 2f
- V{p(out)}=V{sec}/2 -0.7\,\text{V}
- \text{PIV}=2V_{p(out)}+0.7
- Bridge: four diodes, no CT
- V{p(out)}=V{sec}-1.4\,\text{V} (two diode drops)
- \text{PIV}=V_{p(out)}+0.7 per diode
- Full-wave average V{AVG}=\dfrac{2Vp}{\pi} (≈63.7 % of V_p)
Power-Supply Filters & Regulators
- Capacitor-input (π-filter) most common
- Capacitor charges to peak, discharges through RL ⇒ ripple voltage V{r(pp)}
- For FWR approx: V{r(pp)} \approx \dfrac{V{p(rect)}}{f R_L C} ( f=120\,\text{Hz} )
- Ripple factor r=V{r(pp)}/(2\sqrt{2}V{DC}); smaller r = better filtering
- Surge current occurs at power-on while capacitor uncharged ⇒ use slow-blow fuse in primary
- Voltage regulators (3-terminal IC)
- Maintain constant V_{out} vs line or load changes
- Line regulation: \Delta V{out}/\Delta V{in}
- Load regulation: \dfrac{V{NL}-V{FL}}{V_{FL}}\times100\%
Zener Diode
- Heavily-doped junction designed for operation in reverse breakdown at precise V_Z (≈ 1 V – 250 V)
- Breakdown mechanisms
- Zener (<5 V): field-ionisation
- Avalanche (>5 V)
- Zener equivalent
- Ideal: constant voltage source V_Z (reverse)
- Practical: includes small impedance ZZ = \Delta VZ/\Delta I_Z
- Regulation limits: I{ZK} ≤ IZ ≤ I{ZM} (max via PD(max)=VZ I{ZM})
- Temperature coefficient TC: \Delta VZ = VZ \times TC \times \Delta T
- Power derating above 25 °C: P{max}(T)=P{25}-DF\,(T-25)
- Applications
- Voltage reference/regulator (series resistor limits current)
- Limiter/clipper circuits
Varactor (Varicap) Diode
- Reverse-biased pn junction acts as voltage-controlled capacitor: CT \propto 1/\sqrt{VR}
- Doping profile & geometry set C{max}, C{min}, C_R (capacitance ratio)
- Used in tuners, VCOs, filters; often back-to-back for symmetrical characteristics
Optical Diodes
- Light-Emitting Diode (LED)
- Forward bias → e⁻-hole recombination releases photons (electroluminescence)
- Materials dictate colour (GaAs IR, GaAsP red–yellow, GaN blue, InGaN white with phosphor)
- VF ≈ 1.2–3.2 V; IF 10–30 mA
- Radiation patterns vary (indicator vs high-intensity)
- Applications: indicators, 7-segment displays, IR remote, traffic lights (series-parallel arrays), lighting
- OLED: organic layers produce light; printable; flexible displays
- Quantum dots: nano-crystals, size-dependent bandgap → colour tuning; used in LED filters, bio-imaging
- Photodiode
- Operates in reverse bias; photon absorption generates current proportional to irradiance
- Dark current (no light) very small
- Used in detectors, opto-isolators, fiber optics
- Laser Diode: similar to LED but with resonant cavity → coherent monochromatic light; used in CD/DVD, fibre-optic, laser printers
Other Special-Purpose Diodes
- Schottky (hot-carrier): metal-semiconductor junction; V_F ≈ 0.3 V; fast switching
- PIN diode: intrinsic layer between p and n ➔ variable resistance (forward) or capacitance (reverse); RF switches, attenuators
- Step-Recovery: graded junction; sharp turn-off → harmonic generation
- Tunnel diode: very heavily doped; exhibits negative resistance region; microwave oscillators
- Current-Regulator Diode (CRD): maintains constant current IP over wide V{AK} range
Bipolar Junction Transistor (BJT) Structure
- Three doped regions: Emitter (heavily), Base (light, thin), Collector (moderate)
- Two pn junctions: Base-Emitter (BE), Base-Collector (BC)
- Types & symbols: npn (arrow out), pnp (arrow in); arrow indicates conventional emitter current
Basic BJT Operation
- Forward-reverse bias for linear use: BE junction F-B, BC junction R-B
- Current flow (npn)
- Majority e⁻ injected from emitter to base; few recombine (IB); most swept into collector (IC)
- Kirchhoff: IE = IC + I_B
Key Parameters
- DC current gain \beta{DC}=h{FE}=IC/IB (20–200+)
- \alpha{DC}=IC/I_E\approx \beta/(\beta+1)
DC Bias Analysis
- With bias sources V{BB},V{CC} and resistors RB,RC
- Approximate V_{BE}=0.7\,\text{V} (Si)
- IB=(V{BB}-0.7)/RB; IC=\beta I_B
- V{CE}=V{CC}-IC RC; V{CB}=V{CE}-0.7
Collector Characteristic Curves
- Family of IC vs V{CE} for various I_B
- Regions
- Cutoff (IB≈0, IC≈0, VCE≈VCC)
- Active/Linear (IC=βIB, BC reverse-biased)
- Saturation (both junctions forward, IC at I_{C(sat)})
- Breakdown (avoid)
- I{C(sat)}=(V{CC}-V{CE(sat)})/RC (neglect V_{CE(sat)} small)
- I{B(min)}=I{C(sat)}/\beta; design with IB≫I{B(min)}
- DC load line: line between cutoff point (V{CE}=V{CC}, IC=0) and saturation (V{CE}=V{CE(sat)}, IC=I_{C(sat)}) on characteristic graph
Temperature & Ratings
- β increases with temperature; device parameters vary
- Maximum ratings: V{CEO(max)}, V{CBO(max)}, I{C(max)}, P{D(max)}
- PD = V{CE} I_C; derate above 25 °C using datasheet factor (mW/°C)
BJT as a Voltage Amplifier
- AC superimposed on DC bias
- Small-signal emitter resistance r'e ≈ 25\,mV/IE (at 25 °C)
- Voltage gain (common-emitter, unbypassed) Av = - RC / r'_e (negative sign ⇒ inversion)
- Output Vo = Av V_{in}
BJT as a Switch
- Two states
- Cutoff: IB=0 ⇒ IC\approx0, V{CE}\approx V{CC}
- Saturation: IB \ge I{B(min)} ⇒ V{CE}\approx V{CE(sat)}\,(\sim0.1–0.3\,V), IC=I{C(sat)}
- Application example: driving LED; ensure IB > 2 I{B(min)} for safe saturation