SKY WATER 130NM PDK

ANALOG PROJECT

TEST MIM CAP

Metal-insulator-metal (MIM)

These capacitors are widely used because they exhibit high capacitance per unit area. To further enhance the capacitance value, MIM capacitors are typically constructed using three plates, two metal layers from the standard fabrication process (which often are the topmost layers), and a special metal layer in the middle. This unique arrangement allows MIM capacitors to achieve higher capacitance density while maintaining the advantages of stable performance and low leakage associated with their insulating dielectric material.

Advantages of metal-insulator-metal capacitors

Stable capacitance
High capacitance per unit area
Good quality factor
Good linearity

Disadvantages of metal-insulator-metal capacitors

Special process required to create masking layers
Increased cost

Schematic

Simulation Results

Conclude

MIM Cap Layer: Need check later in layout

MIM Cap sizing: 10u*10u*2

MIM Capacitance: 0.41pF

TEST MOS CAP:

MOS Cap

Metal-oxide-semiconductor (MOS) capacitors are essentially a transistor that is used as a capacitor.

The capacitance value of MOS capacitors depends on the DC voltage applied at the gate. The varying voltage changes the depletion areas at the gate, altering the dielectric properties and subsequently modifying the capacitance. MOS capacitors are particularly useful for local supply decoupling applications, in which the DC voltage remains constant.

Advantages of metal-oxide-semiconductor capacitors