ELCT363_Lecture11_Crriers_in_Semiconductor_Spring2025 -IA8

Page 1: Course Overview and Announcements

  • Course: ELCT 363: Introduction to Microelectronics

  • Topics Covered:

    • Doping of semiconductors (Reference: Streetman, Ch. 3)

      • Intrinsic carriers in semiconductors

      • Carrier concentrations in n-type semiconductor

      • Carrier concentrations in p-type semiconductor

      • Fermi level in n- and p-type semiconductor

      • Compensated semiconductor

  • Announcements:

    • 3rd Quiz (Quiz 3) scheduled for Tuesday, 2/18/25

    • Midterm exam on Thursday, 3/20/25

Page 2: Intrinsic Semiconductors

  • Electrons and Holes:

    • Formula for electron concentration in n-type:n0 = Nc exp[-(Ec - Ef)/(kT)]

    • Formula for hole concentration in p-type:p0 = Nv exp[-(Ef - Ev)/(kT)]

Page 3: Intrinsic Electron Concentration

  • In intrinsic semiconductors:

    • Fermi level (EF) equals the intrinsic energy level (Ei): EF = Ei = Eg/2.

    • Electron and Hole Pairing:

      • Electrons and holes appear in pairs: ni = pi

  • Equations:

    • For intrinsic semiconductors, the relationships include:

      • n = Nc exp[-(Ec - Ef)/(kT)]

      • p = Nv exp[-(Ef - Ev)/(kT)]

Page 4: Doping of Semiconductors

  • Doping Definition: Introduce impurities (dopants) in Silicon (Si).

  • At 300K:

    • Free electron concentration in Si: n300K = 1.3 × 10^10 cm-3

    • Resistance of Si at 300K: 4.8 × 10^5 Ohm

    • Pure Si is not a good conductor of electricity.

    • Doping allows control over semiconductor conductivity.

    • Microelectronics devices predominantly use doped semiconductors.

Page 5: Donor Impurities in n-Type Semiconductors

  • Doping with Phosphorus:

    • Phosphorus (P) has 5 outer shell electrons, resulting in one additional valence electron.

    • Minimal energy is needed to create a free electron from phosphorous atom, resulting in each donor atom creating one free electron.

    • Concentration of free electrons in n-type is calculated as: n = ND + ni, where ni is typically 1.3 × 10^10 cm-3.

    • Doping concentration range: ND = 10^15 cm-3 to 10^19 cm-3.

    • In n-type materials: Electrons are the majority carriers, holes are minority carriers.

Page 6: Acceptor Impurities in p-Type Semiconductors

  • Doping with Boron:

    • Boron (B) has three valence electrons, creating a hole in the silicon lattice (not filling all bonds).

    • This hole can participate in conduction, making boron an acceptor impurity.

    • Concentration of holes is given by: p = NA + pi, where NA is the doping concentration, typically NA = 10^15 to 10^19 cm-3.

    • In p-type, holes are the majority carriers while electrons are the minority carriers.

Page 7: Carrier Concentrations Summary

  • Intrinsic Semiconductor:

    • n = p

  • Extrinsic Carrier Concentration:

    • For n-type: n > p (Donor) => nn = ND

    • For p-type: p > n (Acceptor) => pp = NA

    • Formula for charge neutrality: n x p = ni^2

    • Doping enhances conductivity.

Page 8: Examples of Donors & Acceptors

  • n-Type (Majority carriers: Electrons):

    • Donor impurities (Column V of Periodic Table): P, As, N.

  • p-Type (Majority carriers: Holes):

    • Acceptor impurities (Column III of Periodic Table): B, Al, Ga.

  • Silicon (IV element) and III-V Compounds: GaN, GaAs, etc.

Page 9: Fermi Level in n-Type Semiconductors

  • Energy Levels:

    • In n-type, most mobile charges are free electrons; therefore:

      • EF_n ≈ EC.

    • Phosphorus (P) provides free electrons due to its five valence electrons.

Page 10: Fermi Level in p-Type Semiconductors

  • Energy Levels:

    • In p-type, most mobile charges are holes, hence:

      • EF_p ≈ EV.

    • Boron (B) introduces electron vacancies (holes).

Page 11: Fermi Level in Doped Semiconductors

  • Generalization:

    • In n-type: EF ≈ EC (mostly free electrons).

    • In p-type: EF ≈ EV (mostly holes).

    • In intrinsic semiconductors: EF = Ei = Eg/2.

Page 12: Electron Density in n-Type Semiconductors

  • Formula for electron density in n-type:

    • n_d = N_d - N_d +

    • At temperature T, fraction of electrons in donor level:

      • n_d = N_d / [1 + 1/2 exp[(E_d - EF)/(kT)]]

Page 13: Example in n-Type Semiconductors

  • Example: Determine the fraction of total electrons in donor states at 300K with:

    • Nd = 10^16 cm-3 (Phosphorus).

    • Calculate using E_d = Ec - Ed = 0.045ev and kT = 0.0259 eV.

    • Result: 0.0041 or 0.41%, indicating most electrons are in conduction band and free to move.

Page 14: Hole Density in p-Type Semiconductors

  • Formula:

    • n_a = N_a - N_a +

    • Fraction of holes in donor level:

      • n_a = N_a / [1 + 1/4 exp[(EF - E_a)/(kT)]]

Page 15: Comparison of Band Structures

  • Comparison of intrinsic, n-type, and p-type band structures to understand energy levels and band gaps.

Page 16: Degenerate Semiconductors

  • Increasing Doping:

    • As doping increases, dopant atoms become closer; their wave functions overlap, creating bands.

    • These are called degenerate semiconductors, while the course focuses on non-degenerate semiconductors.

Page 17: Fermi Level in n-Type Semiconductors

  • Position calculation for n-type semiconductors:

    • n0 ni Nc e^[-(Ec - EF)/(kT)] = Nc e^[-(Ec - Ei)/(kT)] = e^(EF/kT)e^(Ei/kT).

  • The position of the Fermi level depends on doping concentration.

Page 18: Fermi Level in p-Type Semiconductors

  • Position calculation for p-type semiconductors:

    • p0 pi NV e^[-(EF - Ev)/(kT)] = NV e^[-(Ei - Ev)/(kT)] = e^[-EF/kT]e^[-Ei/kT].

Page 19: Carrier Concentration and Fermi Energy Position

  • Note: As doping slowly increases in silicon, the Fermi level shifts toward respective bands.

Page 20: Charge Carrier Concentration

  • Charge Carriers:

    • Two types: "Free" Electrons (n) and Holes (p).

  • Carrier concentrations:

    • At thermal equilibrium (n0 or p0).

    • For intrinsic (ni or pi).

    • For doped semiconductors (nn, pn, np, or pp).