ELCT363_Lecture11_Crriers_in_Semiconductor_Spring2025 -IA8
Page 1: Course Overview and Announcements
Course: ELCT 363: Introduction to Microelectronics
Topics Covered:
Doping of semiconductors (Reference: Streetman, Ch. 3)
Intrinsic carriers in semiconductors
Carrier concentrations in n-type semiconductor
Carrier concentrations in p-type semiconductor
Fermi level in n- and p-type semiconductor
Compensated semiconductor
Announcements:
3rd Quiz (Quiz 3) scheduled for Tuesday, 2/18/25
Midterm exam on Thursday, 3/20/25
Page 2: Intrinsic Semiconductors
Electrons and Holes:
Formula for electron concentration in n-type:n0 = Nc exp[-(Ec - Ef)/(kT)]
Formula for hole concentration in p-type:p0 = Nv exp[-(Ef - Ev)/(kT)]
Page 3: Intrinsic Electron Concentration
In intrinsic semiconductors:
Fermi level (EF) equals the intrinsic energy level (Ei): EF = Ei = Eg/2.
Electron and Hole Pairing:
Electrons and holes appear in pairs: ni = pi
Equations:
For intrinsic semiconductors, the relationships include:
n = Nc exp[-(Ec - Ef)/(kT)]
p = Nv exp[-(Ef - Ev)/(kT)]
Page 4: Doping of Semiconductors
Doping Definition: Introduce impurities (dopants) in Silicon (Si).
At 300K:
Free electron concentration in Si: n300K = 1.3 × 10^10 cm-3
Resistance of Si at 300K: 4.8 × 10^5 Ohm
Pure Si is not a good conductor of electricity.
Doping allows control over semiconductor conductivity.
Microelectronics devices predominantly use doped semiconductors.
Page 5: Donor Impurities in n-Type Semiconductors
Doping with Phosphorus:
Phosphorus (P) has 5 outer shell electrons, resulting in one additional valence electron.
Minimal energy is needed to create a free electron from phosphorous atom, resulting in each donor atom creating one free electron.
Concentration of free electrons in n-type is calculated as: n = ND + ni, where ni is typically 1.3 × 10^10 cm-3.
Doping concentration range: ND = 10^15 cm-3 to 10^19 cm-3.
In n-type materials: Electrons are the majority carriers, holes are minority carriers.
Page 6: Acceptor Impurities in p-Type Semiconductors
Doping with Boron:
Boron (B) has three valence electrons, creating a hole in the silicon lattice (not filling all bonds).
This hole can participate in conduction, making boron an acceptor impurity.
Concentration of holes is given by: p = NA + pi, where NA is the doping concentration, typically NA = 10^15 to 10^19 cm-3.
In p-type, holes are the majority carriers while electrons are the minority carriers.
Page 7: Carrier Concentrations Summary
Intrinsic Semiconductor:
n = p
Extrinsic Carrier Concentration:
For n-type: n > p (Donor) => nn = ND
For p-type: p > n (Acceptor) => pp = NA
Formula for charge neutrality: n x p = ni^2
Doping enhances conductivity.
Page 8: Examples of Donors & Acceptors
n-Type (Majority carriers: Electrons):
Donor impurities (Column V of Periodic Table): P, As, N.
p-Type (Majority carriers: Holes):
Acceptor impurities (Column III of Periodic Table): B, Al, Ga.
Silicon (IV element) and III-V Compounds: GaN, GaAs, etc.
Page 9: Fermi Level in n-Type Semiconductors
Energy Levels:
In n-type, most mobile charges are free electrons; therefore:
EF_n ≈ EC.
Phosphorus (P) provides free electrons due to its five valence electrons.
Page 10: Fermi Level in p-Type Semiconductors
Energy Levels:
In p-type, most mobile charges are holes, hence:
EF_p ≈ EV.
Boron (B) introduces electron vacancies (holes).
Page 11: Fermi Level in Doped Semiconductors
Generalization:
In n-type: EF ≈ EC (mostly free electrons).
In p-type: EF ≈ EV (mostly holes).
In intrinsic semiconductors: EF = Ei = Eg/2.
Page 12: Electron Density in n-Type Semiconductors
Formula for electron density in n-type:
n_d = N_d - N_d +
At temperature T, fraction of electrons in donor level:
n_d = N_d / [1 + 1/2 exp[(E_d - EF)/(kT)]]
Page 13: Example in n-Type Semiconductors
Example: Determine the fraction of total electrons in donor states at 300K with:
Nd = 10^16 cm-3 (Phosphorus).
Calculate using E_d = Ec - Ed = 0.045ev and kT = 0.0259 eV.
Result: 0.0041 or 0.41%, indicating most electrons are in conduction band and free to move.
Page 14: Hole Density in p-Type Semiconductors
Formula:
n_a = N_a - N_a +
Fraction of holes in donor level:
n_a = N_a / [1 + 1/4 exp[(EF - E_a)/(kT)]]
Page 15: Comparison of Band Structures
Comparison of intrinsic, n-type, and p-type band structures to understand energy levels and band gaps.
Page 16: Degenerate Semiconductors
Increasing Doping:
As doping increases, dopant atoms become closer; their wave functions overlap, creating bands.
These are called degenerate semiconductors, while the course focuses on non-degenerate semiconductors.
Page 17: Fermi Level in n-Type Semiconductors
Position calculation for n-type semiconductors:
n0 ni Nc e^[-(Ec - EF)/(kT)] = Nc e^[-(Ec - Ei)/(kT)] = e^(EF/kT)e^(Ei/kT).
The position of the Fermi level depends on doping concentration.
Page 18: Fermi Level in p-Type Semiconductors
Position calculation for p-type semiconductors:
p0 pi NV e^[-(EF - Ev)/(kT)] = NV e^[-(Ei - Ev)/(kT)] = e^[-EF/kT]e^[-Ei/kT].
Page 19: Carrier Concentration and Fermi Energy Position
Note: As doping slowly increases in silicon, the Fermi level shifts toward respective bands.
Page 20: Charge Carrier Concentration
Charge Carriers:
Two types: "Free" Electrons (n) and Holes (p).
Carrier concentrations:
At thermal equilibrium (n0 or p0).
For intrinsic (ni or pi).
For doped semiconductors (nn, pn, np, or pp).