3_DAY_REPORT revised with Abbreviations(1)
Page 1: Lecture Schedule
Event: Advancements in Semiconductor Technologies
Dates: 18-12-2024 to 20-12-2024
Organizers: Naman Jain (Indian Institute of Information Technology Guwahati) and Krushna Dinesh Rane (Indian Institute of Technology Roorkee)
Schedule Breakdown
18th December 2024
Session: Development & Future Trends of 3D-IC Packaging Technology
Duration: 1.5 hours (11:30 AM - 1 PM), 1.5 hours (2:30 PM - 4 PM)
Speaker: Prof. Chang-Chun Lee, Department of Power Mechanical Engineering, NTHU
19th December 2024
Session: Manufacturing Processes of Advanced Nano Devices
Duration: 3 hours (9:30 AM - 12:30 PM), 3 hours (2 PM - 5 PM), 2 hours (11:30 AM - 1 PM)
Speaker: Prof. Tsung-Chieh Cheng, Department of Mechanical Engineering, National Kaohsiung University of Science and Technology
20th December 2024
Session 1: The Trends of Advanced Heterogeneous Integration Packaging
Duration: 3 hours (9:30 AM - 12:30 PM)
Speaker: Prof. Meng-Kai Shih, Department of Mechanical and Electromechanical Engineering, National Sun Yat-sen University, Kaohsiung
Session 2: The Development of Semiconductor Industry and Technology in Taiwan
Duration: 2 hours (3:30 PM - 5:30 PM)
Speaker: Dr. Yu-Hua Huang, Program Manager, TCSFT, NTHU
Highlights
Taiwan’s contributions to global semiconductor technology
Trends in semiconductor R&D and industrial growth
Page 2: Future Trends of 3D-IC Packaging Technology
Introduction
Concept of More Than Moore from a Taiwanese perspective, referring to innovations extending beyond traditional scaling of transistors as per Moore’s Law.
Course Outline
Fan-Out Packaging Development and Status
3D IC Packaging Trends and Key Technologies
Heterogeneous IC Packaging Development
Scaling Trends Briefing:
Scaling semiconductor components from 90 nm down to 1 nm.
Basics of Wafer-Level Packaging (WLP)
WLP is an integral process in IC manufacturing, packaging done at the wafer level before dicing.
Types of WLP:
Fan-in WLP:
Size matches die size with connections within the die area.
Fan-out WLP:
Expands beyond chip area for additional component integration (SiP).
Technologies:
Fan-in: Redistribution Layer (RDL) and bumping (solder bumps).
Fan-out: Wafer reconstruction and integration of active devices.
Page 3: Comparison of Fan-out and Fan-in Packaging
Key Aspects:
Connection Distribution:
Fan-out: Spreads connections outward increasing pin density.
Fan-in: Limits connections within die area, affecting potential I/O.
Package Size:
Fan-out: Can reduce package size due to efficient connection distribution.
Fan-in: Generally larger due to limited density.
Application:
Fan-out is suited for high-performance devices needing many I/O connections.
Fan-in works for simpler designs with basic I/O requirements.
TSV and Microbump Technology in IC Packaging
TSV (Through Silicon Via): Vertical electrical pathways in 3D stacking configurations.
Microbumps: Connects stacked chips on TSVs enabling complex circuitry with lower footprint.
Page 4: CoWoS and InFO Technologies
CoWoS Technology:
Description: Chip-on-Wafer-on-Substrate, enabling integration of multiple chips in a package.
TSMC’s InFO Technology:
Description: Advanced packaging, RDL created directly on wafer with wider connections.
Types of InFO:
InFO PoP: Stacks memory chips on processors (mobile devices).
InFO oS: Larger packages for high-performance systems.
Points Concluded:
Importance of IC packaging in protecting from environmental factors and ensuring efficient power delivery.
Page 5: Advanced IC Packaging Techniques
Wafer-Level Packaging (WLP) and Chip-Scale Packaging (CSP)
WLP: Package at wafer level; CSP: Compact packages close to die size.
Panel-Level Packaging (PLP):
Uses rectangular panels, allowing for larger batch processing at lower cost.
Comparison of WLP and PLP:
Aspect | WLP | PLP |
|---|---|---|
Chip Integration | Limited | Greater |
Cost | Higher | Lower |
Reliability Tests:
Thermal Cycle Test (TCT): Assess durability under temperature variations.
Page 6: Heterogeneous vs. Homogeneous Packaging
Definitions:
Homogeneous Packaging: Combines similar functionality chips (e.g., memory).
Heterogeneous Packaging: Integrates diverse functionalities (e.g., processors and GPUs).
Fan-In and Fan-Out Packaging:
Fan-In WLP: Contains interconnections limited to chip area.
Fan-Out WLP: Significant expansion using RDL, improving connection capacities.
Page 7: Day 2 Summary - Manufacturing Processes of Advanced Nano Devices
Overview:
Historical evolution of memory manufacturing processes and trends in the semiconductor industry.
Key Semiconductor Trends:
Increased chip performance via smaller features.
Enhanced reliability through design advancements.
Reduced process costs through scaling.
Evolution of Wafer Size:
Timeline: From 50 mm in 1965 to 300 mm by 2000.
FinFETs Explained:
Significance: 3D structure minimizing short-channel effects and enhancing performance.
Pages 8-31: Further Elaborations on Semiconductor Manufacturing
FinFET vs. Planar MOSFET:
Decrease in leakage current, improved power efficiency, rapid switching speeds in FinFETs.
CVD and PVD Processes:
Thin film deposition methods with a focus on varying techniques.
Immersion Lithography’s Role:
Aids in achieving higher resolution through fluids.
Comparative Analyses of Various Technologies:
Highlights of wafer-level technologies, IC fabrication methods, and their unique advantages.
Integrated Circuit Technologies:
Discusses the evolution and application of various IC construction methodologies.
Advanced Packaging Comparisons:
EMIB vs. 2.5D interposers illustrating design and cost efficiency.
Hsinchu Science Park Overview:
Taiwan's semiconductor industry hub and its advantages.
Final Conclusions:
Comprehensive insights in semiconductor advancements, ongoing trends, and projected growth.
Used Abbreviations:
Key abbreviations relevant to semiconductor technology for quick reference.