Semiconductor Crystal Structure and Fundamentals

Course Curriculum and Thematic Scope

  • The study of semiconductor physics encompasses ten foundational subject areas:

    • Semiconductor crystal structure

    • Semiconductor band structure

    • Bandgap engineering

    • Manufacturing of semiconductors

    • Carrier distributions in semiconductors

    • Electrical properties of semiconductors

    • Recombination processes in semiconductors

    • Absorption of light in semiconductors

    • The pnpn-junction

    • Semiconductor devices

Fundamental Properties and Taxonomy of Semiconductors

  • Dual Charge Carrier Mechanisms:

    • Unlike metals, which conduct current exclusively via electrons, semiconductors possess two distinct classes of mobile charge carriers:

    • Negative charge carriers: conduction-band electrons (e−e^-).

    • Positive charge carriers: valence-band vacancies termed holes (h+h^+).

  • Chemical Doping and Carrier Concentration Control:

    • Introducing extrinsic impurity atoms (dopants) into an intrinsic crystal lattice modulates and increases the concentration of specific carrier types by orders of magnitude:

    • nn-type (or nn-doped) semiconductors: contain donor impurities yielding a majority carrier population of electrons.

    • pp-type (or pp-doped) semiconductors: contain acceptor impurities yielding a majority carrier population of holes.

  • Structural and Chemical Classes of Semiconductor Materials:

    • Elemental semiconductors: Group IV elements of the periodic table, specifically silicon (SiSi) and germanium (GeGe).

    • Compound semiconductors:

    • III-V binary compounds: formed between Group 13 and Group 15 elements, including gallium nitride (GaNGaN), gallium arsenide (GaAsGaAs), aluminum nitride (AlNAlN), and indium antimonide (InSbInSb).

    • II-VI binary compounds: formed between Group 12 and Group 16 elements, including cadmium sulfide (CdSCdS), zinc oxide (ZnOZnO), and mercury telluride (HgTeHgTe).

    • I-III-VI2_2 chalcopyrite compounds: such as copper indium diselenide (CuInSe2CuInSe_2).

    • Alloy semiconductors (solid solutions):

    • Group IV alloys: binary mixtures such as SixGe1−xSi_xGe_{1-x}.

    • Group III-V ternary alloys: such as GaxIn1−xNGa_xIn_{1-x}N.

    • Group III-V quaternary alloys: such as GaxIn1−xAsyP1−yGa_xIn_{1-x}As_yP_{1-y}.

  • Commercial, Economic, and Technological Considerations:

    • Silicon (SiSi) dominance in microelectronics:

    • Economic advantage: standard 8-inch8\text{-inch} (8′′8'') silicon wafers cost approximately 40 €40\,€, whereas 2-inch2\text{-inch} (2′′2'') compound semiconductor wafers (GaAsGaAs or InPInP) cost approximately 200 €200\,€.

    • Material perfection: high crystalline purity and atomic flatness are achievable on large wafer diameters.

    • Fabrication maturity: supported by an advanced manufacturing and lithographic infrastructure.

    • High-speed electronics (operating at high frequencies up to 600 GHz600\,\text{GHz}):

    • Dominated by materials exhibiting high carrier mobilities, specifically GaAsGaAs, InPInP, and SiGeSiGe, alongside emerging GaNGaN technologies.

    • High-voltage power applications:

    • Dominated by wide-bandgap semiconductors with high breakdown fields, primarily gallium nitride (GaNGaN) and silicon carbide (SiCSiC).

    • Optoelectronic systems (lasers, LEDs, photodetectors):

    • Compound semiconductors such as GaAsGaAs, InPInP, and GaNGaN are utilized due to their direct electronic bandgaps, which allow efficient radiative recombination.

Electronic Shell Structures and Valence Configurations

  • Aufbau Orbital Filling Sequence:

    • Electrons fill atomic subshells according to increasing energy levels in the standard progression:     1s,2s,2p,3s,3p,4s,3d,4p,5s,4d,5p,6s,4f,5d,6p,7s,5f,6d,7p1s, 2s, 2p, 3s, 3p, 4s, 3d, 4p, 5s, 4d, 5p, 6s, 4f, 5d, 6p, 7s, 5f, 6d, 7p

    • Subshell electron capacities governed by the Pauli exclusion principle:

    • ss-orbital: maximum of 22 electrons.

    • pp-orbital: maximum of 66 electrons.

    • dd-orbital: maximum of 1010 electrons.

    • ff-orbital: maximum of 1414 electrons.

  • Electronic Configurations of Key Semiconductor Elements:

    • Silicon (SiSi, atomic number Z=14Z = 14):

    • Electron configuration: 1s22s22p63s23p21s^2 2s^2 2p^6 3s^2 3p^2.

    • Features 44 valence electrons in the outermost n=3n=3 principal shell, leaving 44 vacancies to achieve octet completion (3s23p63s^2 3p^6).

    • Gallium (GaGa, atomic number Z=31Z = 31):

    • Electron configuration: 1s22s22p63s23p63d104s24p11s^2 2s^2 2p^6 3s^2 3p^6 3d^{10} 4s^2 4p^1.

    • Features 33 valence electrons in the outermost shell, requiring 55 electrons to achieve a closed shell configuration.

    • Arsenic (AsAs, atomic number Z=33Z = 33):

    • Electron configuration: 1s22s22p63s23p63d104s24p31s^2 2s^2 2p^6 3s^2 3p^6 3d^{10} 4s^2 4p^3.

    • Features 55 valence electrons in the outermost shell, requiring 33 electrons to complete its valence octet.

Interatomic Bonding Mechanisms in Solids

  • Primary Classes of Interatomic Chemical Bonds:

    • Ionic bond:

    • Formation mechanism: complete transfer of one or more electrons from an electropositive atom to an electronegative atom, forming opposing ions bound by electrostatic attraction.

    • Physical properties: high melting point, hard and brittle mechanical nature, electrically nonconducting in the solid crystal phase.

    • Examples: sodium chloride (NaClNaCl), cesium chloride (CsClCsCl), zinc sulfide (ZnSZnS).

    • Covalent bond:

    • Formation mechanism: mutual sharing of localized valence electron pairs between neighboring atomic orbitals.

    • Physical properties: very high melting point, high hardness, brittle mechanical behavior, generally nonconducting at low temperatures.

    • Examples: diamond (CC), crystalline silicon (SiSi), planar sheets of graphite.

    • Metallic bond:

    • Formation mechanism: positively charged ion cores held within a delocalized, collective gas of valence conduction electrons.

    • Physical properties: variable melting points, variable hardness, ductile and malleable mechanical behavior, high electrical and thermal conductivity.

    • Examples: iron (FeFe), copper (CuCu), silver (AgAg).

    • Van der Waals bond:

    • Formation mechanism: weak, non-directional electrostatic attraction resulting from fluctuating or induced electric dipole moments.

    • Physical properties: low melting point, soft and mechanically brittle, electrically nonconducting.

    • Examples: solidified noble gases (NeNe, ArAr, KrKr, XeXe), interlayer stacking cohesion in graphite.

    • Hydrogen bond:

    • Formation mechanism: dipolar interaction between a covalently bonded hydrogen atom and an adjacent electronegative atom (OO, NN, or FF).

    • Physical properties: low melting point, hard and brittle, generally nonconducting.

    • Examples: solid ice (H2OH_2O), molecular organic crystals.

  • Covalent Bonding in Elemental and Compound Semiconductors:

    • Covalent network in pure silicon (SiSi):

    • Each silicon atom shares its 44 outer electrons with 44 neighboring atoms in a tetrahedral arrangement, saturating the outer valence shell with 88 shared electrons.

    • In pure, undoped silicon at low temperatures, valence electrons remain localized within these bonding states and cannot participate in electrical conduction, making intrinsic silicon an insulator.

    • Thermal generation or donor/acceptor impurity doping supplies mobile carriers into unbonded states.

    • Covalent network in gallium arsenide (GaAsGaAs):

    • Alternating Gallium (Group III, 33 valence electrons) and Arsenic (Group V, 55 valence electrons) atoms contribute a combined total of 88 valence electrons per atomic pair.

    • All valence electrons participate in localized interatomic bonds, satisfying tetrahedral bonding coordination.

  • Heteropolar Bonding and Fractional Ionic Character:

    • Bonds within semiconductor crystal lattices frequently exhibit a hybrid character between purely covalent and purely ionic states.

    • Quantitative fractional ionic character across semiconductor materials:

    • Group IV-IV materials:

      • Silicon (SiSi): 0.000.00

      • Germanium (GeGe): 0.000.00

      • Silicon carbide (SiCSiC): 0.180.18

    • Group III-V compound materials:

      • Indium phosphide (InPInP): 0.420.42

      • Indium arsenide (InAsInAs): 0.360.36

      • Indium antimonide (InSbInSb): 0.320.32

      • Gallium arsenide (GaAsGaAs): 0.310.31

      • Gallium antimonide (GaSbGaSb): 0.260.26

    • Group II-VI compound materials (strong ionic component):

      • Zinc oxide (ZnOZnO): 0.620.62

      • Zinc sulfide (ZnSZnS): 0.620.62

      • Zinc selenide (ZnSeZnSe): 0.630.63

      • Zinc telluride (ZnTeZnTe): 0.610.61

      • Cadmium oxide (CdOCdO): 0.790.79

      • Cadmium sulfide (CdSCdS): 0.690.69

      • Cadmium selenide (CdSeCdSe): 0.700.70

      • Cadmium telluride (CdTeCdTe): 0.670.67

Ordering Regimes in Solid-State Materials

  • Degrees of Structural Order in Condensed Matter:

    • Single crystals:

    • Atoms are ordered across the entire volume in a periodic, repeating spatial lattice.

    • Exhibits long-range translational symmetry; the crystal environment is identical when displaced by any integer lattice vector.

    • Macroscopic examples include naturally formed quartz crystals.

    • Polycrystals:

    • Aggregates composed of multiple individual single-crystal grains with random spatial orientations, separated by crystallographic grain boundaries.

    • Periodic ordering exists locally within each distinct grain, but long-range crystallographic orientation is broken at the grain boundaries.

    • Technologically exemplified by multicrystalline silicon solar cell wafers.

    • Quasicrystals:

    • Solids characterized by ordered, deterministic atomic arrangements possessing rotational symmetries (such as 5-fold or 10-fold symmetry) that lack translational invariance.

    • Amorphous solids:

    • Materials devoid of long-range periodic crystal structure.

    • Exhibit short-range atomic coordination (such as fixed bond lengths and nearest-neighbor coordination numbers), but lack long-range spatial periodicity.

    • Technologically exemplified by vitreous silica (amorphous SiO2SiO_2).

  • The Crystalline-Amorphous Semiconductor Heterointerface:

  

High-resolution TEM of the interface between amorphous SiO2 and crystalline silicon showing the interface plane and perturbed transition area
  • Transmission electron microscopy (TEM) of the amorphous silicon dioxide (SiO2SiO_2) on crystalline silicon (SiSi) system demonstrates the structural juxtaposition:

    • The underlying crystalline silicon exhibits periodic lattice fringes with a measured interplanar spacing of 3.14 A˚3.14\,\text{\AA} along the [001][001] and [110][110] crystallographic orientations.

    • The interface plane defines a structural boundary between the single-crystal substrate and the disordered glass overlay.

    • A perturbed interface region (marked by positions A, B, and P) contains localized bond straining, broken bonds, and sub-stoichiometric transition oxide species.

Mathematical Formalism of Crystal Lattices

  • Lattice and Basis Composition:

    • A physical crystal structure is constructed by attaching a basis of one or more atoms to each point of an infinite Bravais lattice:     Crystal Structure=Bravais Lattice+Basis\text{Crystal Structure} = \text{Bravais Lattice} + \text{Basis}

    • The basis represents the fundamental assembly of atoms repeated periodically at every lattice site with the symmetry of the underlying Bravais lattice.

    • Invariance under translation: displacing by any real-space lattice translation vector yields an identical atomic environment.

    • Additional spatial symmetries: crystals can display point-group operations including rotation, mirror plane reflection, and spatial inversion.

  • Real-Space Translation Vectors and Unit Cells:

    • Conventional unit cell: a repeated spatial region (area in 2D, volume in 3D) that tiles the crystal, selected to highlight the symmetry of the lattice system.

    • Primitive unit cell: the unit cell containing the minimum possible area or volume that tiles space without voids or overlapping regions.

    • Primitive vectors: linearly independent vectors (denoted {a,b}\{a, b\} in 2D or {a,b,c}\{a, b, c\} in 3D) that define the boundaries of the primitive unit cell.

    • General two-dimensional translation vector:     R=na+mb,n,m∈Z\mathbf{R} = n\mathbf{a} + m\mathbf{b}, \quad n, m \in \mathbb{Z}

    • Multiplicity of primitive vector choices: primitive translation vectors are not unique; multiple distinct sets of vectors can enclose the identical minimum primitive area while defining the same physical lattice.

  • The Wigner-Seitz Primitive Cell:

  

Construction of the Wigner-Seitz primitive cell around a central lattice point using perpendicular bisectors
  • Algorithmic construction sequence:

    • Select an arbitrary lattice point as the origin.

    • Construct line segments connecting this origin point to all adjacent neighboring lattice points.

    • Draw perpendicular bisecting lines (normals in 2D) or planes (in 3D) through the exact midpoints of these line segments.

    • The smallest geometric area or volume enclosing the origin point within these bisecting planes forms the Wigner-Seitz primitive cell.

  • Inherent symmetry: the Wigner-Seitz cell displays the full point-group symmetry of the crystal lattice.

Two-Dimensional and Three-Dimensional Bravais Lattices

  • The Five 2D Bravais Lattices:

  

The five distinct two-dimensional Bravais lattice geometries
  • Square lattice: edge lengths satisfy ∣a1∣=∣a2∣|\mathbf{a}_1| = |\mathbf{a}_2|, with an inter-axis angle of ϕ=90∘\phi = 90^\circ.

  • Rectangular lattice: edge lengths satisfy ∣a1∣≠∣a2∣|\mathbf{a}_1| \neq |\mathbf{a}_2|, with an inter-axis angle of ϕ=90∘\phi = 90^\circ.

  • Centred rectangular lattice: conventional rectangular cell with ∣a1∣≠∣a2∣|\mathbf{a}_1| \neq |\mathbf{a}_2| and ϕ=90∘\phi = 90^\circ, containing an additional lattice point at the center of the rectangle.

  • Hexagonal lattice: edge lengths satisfy ∣a1∣=∣a2∣|\mathbf{a}_1| = |\mathbf{a}_2|, with an inter-axis angle of ϕ=120∘\phi = 120^\circ (or ϕ=60∘\phi = 60^\circ depending on vector choice).

  • Oblique lattice: edge lengths satisfy ∣a1∣≠∣a2∣|\mathbf{a}_1| \neq |\mathbf{a}_2|, with an arbitrary inter-axis angle ϕ≠90∘,120∘\phi \neq 90^\circ, 120^\circ.

    • Three-Dimensional Unit Cell Geometry and Metrics:

  • A 3D unit cell forms a parallelepiped defined by three axial vector lengths (a,b,ca, b, c) and three inter-axial angles:

    • α\alpha: the angle enclosed between axial vectors b\mathbf{b} and c\mathbf{c}.

    • β\beta: the angle enclosed between axial vectors a\mathbf{a} and c\mathbf{c}.

    • γ\gamma: the angle enclosed between axial vectors a\mathbf{a} and b\mathbf{b}.

  • Four unit-cell centering types:

    • Primitive (PP): lattice points reside strictly at the unit cell vertices (11 net lattice point per cell).

    • Body-Centred (II): points at vertices plus a single point at the unit cell body center (22 net lattice points per cell).

    • Face-Centred (FF): points at vertices plus points at the centers of all six bounding faces (44 net lattice points per cell).

    • Side-Centred / Base-Centred (CC): points at vertices plus points centered on two parallel opposite faces (22 net lattice points per cell).

    • The Seven 3D Crystal Classes and Fourteen Bravais Lattices:

  

The 14 three-dimensional Bravais lattices classified across seven crystal classes
  • Cubic System (a=b=ca = b = c; α=β=γ=90∘\alpha = \beta = \gamma = 90^\circ):

    • Simple Cubic (PP)

    • Body-Centered Cubic (II)

    • Face-Centered Cubic (FF)

  • Tetragonal System (a=b≠ca = b \neq c; α=β=γ=90∘\alpha = \beta = \gamma = 90^\circ):

    • Primitive Tetragonal (PP)

    • Body-Centered Tetragonal (II)

  • Orthorhombic System (a≠b≠ca \neq b \neq c; α=β=γ=90∘\alpha = \beta = \gamma = 90^\circ):

    • Primitive Orthorhombic (PP)

    • Body-Centered Orthorhombic (II)

    • Face-Centered Orthorhombic (FF)

    • Side-Centered Orthorhombic (CC)

  • Hexagonal System (a=b≠ca = b \neq c; α=β=90∘\alpha = \beta = 90^\circ, γ=120∘\gamma = 120^\circ):

    • Primitive Hexagonal (PP)

  • Trigonal System / Rhombohedral (a=b=ca = b = c; α=β=γ≠90∘\alpha = \beta = \gamma \neq 90^\circ):

    • Primitive Trigonal (PP)

  • Monoclinic System (a≠b≠ca \neq b \neq c; α=γ=90∘\alpha = \gamma = 90^\circ, β≠120∘\beta \neq 120^\circ):

    • Primitive Monoclinic (PP)

    • Side-Centered Monoclinic (CC)

  • Triclinic System (a≠b≠ca \neq b \neq c; α≠β≠γ≠90∘\alpha \neq \beta \neq \gamma \neq 90^\circ):

    • Primitive Triclinic (PP)

Mathematical Vector Basis and Cell Volumes of Cubic Lattices

  • Simple Cubic (SC) Lattice:

    • Conventional cell length parameter: dd.

    • Primitive translation vectors along Cartesian axes:     a=d i^\mathbf{a} = d\,\hat{\mathbf{i}}     b=d j^\mathbf{b} = d\,\hat{\mathbf{j}}     c=d k^\mathbf{c} = d\,\hat{\mathbf{k}}

    • Volume of the primitive cell:     V=a⋅(b×c)=d3V = \mathbf{a} \cdot (\mathbf{b} \times \mathbf{c}) = d^3

  • Body-Centered Cubic (BCC) Lattice:

    • Conventional cubic edge length: dd.

    • Symmetric primitive translation vectors directed from a corner to the body centers:     a=d2(i^+j^−k^)\mathbf{a} = \frac{d}{2}(\hat{\mathbf{i}} + \hat{\mathbf{j}} - \hat{\mathbf{k}})     b=d2(−i^+j^+k^)\mathbf{b} = \frac{d}{2}(-\hat{\mathbf{i}} + \hat{\mathbf{j}} + \hat{\mathbf{k}})     c=d2(i^−j^+k^)\mathbf{c} = \frac{d}{2}(\hat{\mathbf{i}} - \hat{\mathbf{j}} + \hat{\mathbf{k}})

    • Volume of the primitive cell:     V=∣a⋅(b×c)∣=d32V = |\mathbf{a} \cdot (\mathbf{b} \times \mathbf{c})| = \frac{d^3}{2}

    • Coordination number: 88.

  • Face-Centered Cubic (FCC) Lattice:

    • Conventional cubic edge length: dd.

    • Symmetric primitive translation vectors directed from a corner to adjacent face centers:     a=d2(i^+j^)\mathbf{a} = \frac{d}{2}(\hat{\mathbf{i}} + \hat{\mathbf{j}})     b=d2(j^+k^)\mathbf{b} = \frac{d}{2}(\hat{\mathbf{j}} + \hat{\mathbf{k}})     c=d2(k^+i^)\mathbf{c} = \frac{d}{2}(\hat{\mathbf{k}} + \hat{\mathbf{i}})

    • Volume of the primitive cell:     V=∣a⋅(b×c)∣=d34V = |\mathbf{a} \cdot (\mathbf{b} \times \mathbf{c})| = \frac{d^3}{4}

    • Coordination number: 1212.

    • Nearest-neighbor interatomic distance: d2=d22\frac{d}{\sqrt{2}} = \frac{d\sqrt{2}}{2}.

Principal Semiconductor Crystal Geometries

  • The Diamond Structure:

  

Diamond cubic unit cell structure
  • Space lattice: Face-Centered Cubic (FCC) Bravais lattice.

  • Basis composition: two identical atoms associated with each primitive lattice point, positioned at fractional coordinates:     (0,0,0)and(a4,a4,a4)(0, 0, 0) \quad \text{and} \quad \left(\frac{a}{4}, \frac{a}{4}, \frac{a}{4}\right)

  • Geometry: formed by two interpenetrating FCC sublattices displaced along the body diagonal by one-fourth of the cubic body diagonal length:     a34\frac{a\sqrt{3}}{4}

  • Atomic coordination: each atom is tetrahedrally coordinated to 44 nearest neighbors through sp3sp^3-hybridized covalent bonds.

  • Representative elemental materials: carbon (diamond), silicon (SiSi), and germanium (GeGe).

    • The Zinc-Blende (Sphalerite) Structure:

  

Zinc-blende crystal unit cell exhibiting interpenetrating FCC sublattices with two distinct atomic species
  • Space lattice: Face-Centered Cubic (FCC) Bravais lattice.

  • Basis composition: two distinct chemical elements (a cation and an anion) positioned at:     Cation site: (0,0,0)\text{Cation site: } (0, 0, 0)     Anion site: (a4,a4,a4)\text{Anion site: } \left(\frac{a}{4}, \frac{a}{4}, \frac{a}{4}\right)

  • Geometry: identical to the diamond lattice, but composed of alternating sublattices of differing atomic species.

  • Coordination: each atom possesses 44 tetrahedrally positioned nearest neighbors of the opposing chemical species.

  • Representative compound materials: gallium arsenide (GaAsGaAs), indium phosphide (InPInP), gallium phosphide (GaPGaP), gallium antimonide (GaSbGaSb), indium antimonide (InSbInSb), zinc sulfide (ZnSZnS), and zinc selenide (ZnSeZnSe).

  • Phase stability note: gallium nitride (GaNGaN), silicon carbide (SiCSiC), and zinc oxide (ZnOZnO) are difficult to synthesize in the zinc-blende phase because they form the hexagonal wurtzite phase under equilibrium conditions.

    • Simple Hexagonal and Hexagonal Close-Packed (HCP) Structures:

  • Primitive vectors defining the simple hexagonal Bravais lattice:     a=a i^\mathbf{a} = a\,\hat{\mathbf{i}}     b=a2i^+a32j^\mathbf{b} = \frac{a}{2}\hat{\mathbf{i}} + \frac{a\sqrt{3}}{2}\hat{\mathbf{j}}     c=c k^\mathbf{c} = c\,\hat{\mathbf{k}}

  • Hexagonal Close-Packed (HCP) structure:

    • Formed from two interpenetrating simple hexagonal sublattices displaced relative to one another by the vector:       T=13a+13b+12c\mathbf{T} = \frac{1}{3}\mathbf{a} + \frac{1}{3}\mathbf{b} + \frac{1}{2}\mathbf{c}

    • The Wurtzite Structure:

  • Space structure: two interpenetrating hexagonal close-packed (HCP) sublattices, each occupied by a distinct atomic species (cation and anion), mutually displaced along the cc-axis.

  • Coordination: preserves local tetrahedral coordination, with each atom bonded to four nearest neighbors of the opposite species.

  • Representative compound materials: gallium nitride (GaNGaN), silicon carbide (SiCSiC), zinc oxide (ZnOZnO), and aluminum nitride (AlNAlN).

    • Tetrahedral Orientation in Wurtzite versus Zinc-Blende:

  

Comparative orientation of adjacent atomic tetrahedra in wurtzite and zinc blende
  • Microscopic differences in atomic tetrahedra:

    • In the wurtzite structure, adjacent atomic tetrahedra along the hexagonal cc-axis exhibit an eclipsed conformation (possessing mirror symmetry across the basal plane).

    • In the zinc-blende structure, adjacent atomic tetrahedra along the cubic [1,1,1][1,1,1] axis exhibit a staggered conformation (rotated by 60∘60^\circ, possessing inversion symmetry).

    • Stacking Sequences of Close-Packed Spheres:

  

Geometry of close-packed spherical layers showing hollow sites B and C on top of base layer A
  • Layering of hard spheres on a planar hexagonal array:

    • The initial layer of packed spheres is designated as layer AA.

    • The second layer of spheres nests in the triangular interstitial hollows of layer AA, designated as positions BB.

    • Placement of the third layer determines the overall crystal symmetry:

      • Placing the third layer directly aligned above layer AA produces the two-layer repeating sequence:         …ABABAB…\dots ABABAB\dots         This sequence generates the Hexagonal Close-Packed (HCP) and Wurtzite structures.

      • Placing the third layer in the remaining interstitial sites CC produces the three-layer repeating sequence:         …ABCABCABC…\dots ABCABCABC\dots         This sequence generates the Face-Centered Cubic (FCC) and Zinc-Blende structures.

    • Polytypism: the existence of varied repeating stacking orders of chemically identical layers gives rise to distinct crystal polytypes, as observed in silicon carbide (SiCSiC) polytypes (such as 3C-SiC3C\text{-}SiC, 4H-SiC4H\text{-}SiC, and 6H-SiC6H\text{-}SiC).

Quantitative Metrics of Semiconductor Crystal Lattices

  • Parameter Definitions:

    • Lattice constant (aa): the physical edge length of the conventional unit cell.

    • Coordination number: the total count of nearest-neighbor atomic sites surrounding a central lattice atom:

    • Body-Centered Cubic (BCCBCC): coordination number = 88.

    • Face-Centered Cubic (FCCFCC): coordination number = 1212.

    • Diamond and Zinc-Blende structures: coordination number = 44.

    • Nearest-neighbor distance (dnnd_{\text{nn}}) in cubic semiconductors:

    • For standard Face-Centered Cubic (FCCFCC) lattices:       dnn=a2=a22d_{\text{nn}} = \frac{a}{\sqrt{2}} = \frac{a\sqrt{2}}{2}

    • For Diamond and Zinc-Blende lattices:       dnn=a34d_{\text{nn}} = \frac{a\sqrt{3}}{4}

    • Atomic Packing Fraction (APFAPF):     \text{APF} = \frac{\text{Total Volume of Spheres in Unit Cell}}{\text{Total Volume of Unit Cell}} = \frac{N_{\text{atoms}} \times \left(\frac{4}{3}\pi r^3\right)}{V_{\text{cell}}}}

  • Measured Lattice Constants, Nearest-Neighbor Distances, and Covalent Radii:

    • Structural parameters for elemental and compound semiconductors at 25 ∘C25\,^\circ\text{C} (adapted from M. Shur, Physics of Semiconductor Devices, Prentice Hall, 1990):

    • Group IV Elemental Semiconductors:

      • Silicon (SiSi):

      • Lattice constant aa at 25 ∘C25\,^\circ\text{C}: 5.4309 A˚5.4309\,\text{\AA}

      • Nearest-neighbor distance a34\frac{a\sqrt{3}}{4}: 2.353 A˚2.353\,\text{\AA}

      • Sum of covalent radii: 2.34 A˚2.34\,\text{\AA}

      • Germanium (GeGe):

      • Lattice constant aa at 25 ∘C25\,^\circ\text{C}: 5.6461 A˚5.6461\,\text{\AA}

      • Nearest-neighbor distance a34\frac{a\sqrt{3}}{4}: 2.450 A˚2.450\,\text{\AA}

      • Sum of covalent radii: 2.44 A˚2.44\,\text{\AA}

    • Group III-V Compound Semiconductors (AIIIBVA^{\text{III}}B^{\text{V}}):

      • Aluminum arsenide (AlAsAlAs):

      • Lattice constant aa at 25 ∘C25\,^\circ\text{C}: 5.6611 A˚5.6611\,\text{\AA}

      • Nearest-neighbor distance a34\frac{a\sqrt{3}}{4}: 2.430 A˚2.430\,\text{\AA}

      • Sum of covalent radii: 2.44 A˚2.44\,\text{\AA}

      • Aluminum phosphide (AlPAlP):

      • Lattice constant aa at 25 ∘C25\,^\circ\text{C}: 5.451 A˚5.451\,\text{\AA}

      • Nearest-neighbor distance a34\frac{a\sqrt{3}}{4}: 2.360 A˚2.360\,\text{\AA}

      • Sum of covalent radii: 2.36 A˚2.36\,\text{\AA}

      • Aluminum antimonide (AlSbAlSb):

      • Lattice constant aa at 25 ∘C25\,^\circ\text{C}: 5.136 A˚5.136\,\text{\AA}

      • Nearest-neighbor distance a34\frac{a\sqrt{3}}{4}: 2.224 A˚2.224\,\text{\AA}

      • Sum of covalent radii: 2.52 A˚2.52\,\text{\AA}

      • Boron arsenide (BAsBAs):

      • Lattice constant aa at 25 ∘C25\,^\circ\text{C}: 4.776 A˚4.776\,\text{\AA}

      • Nearest-neighbor distance a34\frac{a\sqrt{3}}{4}: 2.068 A˚2.068\,\text{\AA}

      • Sum of covalent radii: 2.06 A˚2.06\,\text{\AA}

      • Boron nitride (BNBN):

      • Lattice constant aa at 25 ∘C25\,^\circ\text{C}: 3.615 A˚3.615\,\text{\AA}

      • Nearest-neighbor distance a34\frac{a\sqrt{3}}{4}: 1.565 A˚1.565\,\text{\AA}

      • Sum of covalent radii: 1.58 A˚1.58\,\text{\AA}

      • Boron phosphide (BPBP):

      • Lattice constant aa at 25 ∘C25\,^\circ\text{C}: 4.538 A˚4.538\,\text{\AA}

      • Nearest-neighbor distance a34\frac{a\sqrt{3}}{4}: 1.965 A˚1.965\,\text{\AA}

      • Sum of covalent radii: 1.98 A˚1.98\,\text{\AA}

      • Boron antimonide (BSbBSb):

      • Lattice constant aa at 25 ∘C25\,^\circ\text{C}: 5.170 A˚5.170\,\text{\AA}

      • Nearest-neighbor distance a34\frac{a\sqrt{3}}{4}: 2.239 A˚2.239\,\text{\AA}

      • Sum of covalent radii: 2.24 A˚2.24\,\text{\AA}

      • Gallium arsenide (GaAsGaAs):

      • Lattice constant aa at 25 ∘C25\,^\circ\text{C}: 5.6532 A˚5.6532\,\text{\AA}

      • Nearest-neighbor distance a34\frac{a\sqrt{3}}{4}: 2.448 A˚2.448\,\text{\AA}

      • Sum of covalent radii: 2.44 A˚2.44\,\text{\AA}

      • Gallium phosphide (GaPGaP):

      • Lattice constant aa at 25 ∘C25\,^\circ\text{C}: 5.4495 A˚5.4495\,\text{\AA}

      • Nearest-neighbor distance a34\frac{a\sqrt{3}}{4}: 2.360 A˚2.360\,\text{\AA}

      • Sum of covalent radii: 2.36 A˚2.36\,\text{\AA}

      • Gallium antimonide (GaSbGaSb):

      • Lattice constant aa at 25 ∘C25\,^\circ\text{C}: 6.095 A˚6.095\,\text{\AA}

      • Nearest-neighbor distance a34\frac{a\sqrt{3}}{4}: 2.639 A˚2.639\,\text{\AA}

      • Sum of covalent radii: 2.62 A˚2.62\,\text{\AA}

      • Indium arsenide (InAsInAs):

      • Lattice constant aa at 25 ∘C25\,^\circ\text{C}: 6.0584 A˚6.0584\,\text{\AA}

      • Nearest-neighbor distance a34\frac{a\sqrt{3}}{4}: 2.623 A˚2.623\,\text{\AA}

      • Sum of covalent radii: 2.62 A˚2.62\,\text{\AA}

      • Indium phosphide (InPInP):

      • Lattice constant aa at 25 ∘C25\,^\circ\text{C}: 5.8687 A˚5.8687\,\text{\AA}

      • Nearest-neighbor distance a34\frac{a\sqrt{3}}{4}: 2.540 A˚2.540\,\text{\AA}

      • Sum of covalent radii: 2.54 A˚2.54\,\text{\AA}

      • Indium antimonide (InSbInSb):

      • Lattice constant aa at 25 ∘C25\,^\circ\text{C}: 6.479 A˚6.479\,\text{\AA}

      • Nearest-neighbor distance a34\frac{a\sqrt{3}}{4}: 2.805 A˚2.805\,\text{\AA}

      • Sum of covalent radii: 2.80 A˚2.80\,\text{\AA}

    • Group II-VI Compound Semiconductors (CIIDVIC^{\text{II}}D^{\text{VI}}):

      • Cadmium telluride (CdTeCdTe):

      • Lattice constant aa at 25 ∘C25\,^\circ\text{C}: 6.482 A˚6.482\,\text{\AA}

      • Nearest-neighbor distance a34\frac{a\sqrt{3}}{4}: 2.807 A˚2.807\,\text{\AA}

      • Sum of covalent radii: 2.95 A˚2.95\,\text{\AA}

      • Mercury sulfide (HgSHgS):

      • Lattice constant aa at 25 ∘C25\,^\circ\text{C}: 5.841 A˚5.841\,\text{\AA}

      • Mercury selenide (HgSeHgSe):

      • Lattice constant aa at 25 ∘C25\,^\circ\text{C}: 6.084 A˚6.084\,\text{\AA}

      • Mercury telluride (HgTeHgTe):

      • Lattice constant aa at 25 ∘C25\,^\circ\text{C}: 6.462 A˚6.462\,\text{\AA}

      • Nearest-neighbor distance a34\frac{a\sqrt{3}}{4}: 2.798 A˚2.798\,\text{\AA}

      • Sum of covalent radii: 2.95 A˚2.95\,\text{\AA}

      • Zinc sulfide (ZnSZnS):

      • Lattice constant aa at 25 ∘C25\,^\circ\text{C}: 5.415 A˚5.415\,\text{\AA}

      • Zinc selenide (ZnSeZnSe):

      • Lattice constant aa at 25 ∘C25\,^\circ\text{C}: 5.653 A˚5.653\,\text{\AA}

      • Zinc telluride (ZnTeZnTe):

      • Lattice constant aa at 25 ∘C25\,^\circ\text{C}: 6.101 A˚6.101\,\text{\AA}

      • Nearest-neighbor distance a34\frac{a\sqrt{3}}{4}: 2.642 A˚2.642\,\text{\AA}

      • Sum of covalent radii: 2.78 A˚2.78\,\text{\AA}